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American Vacuum Society. International Symposium (55th: 2008: Boston, Mass)
Invited highlights on plasma-surface interactions: honoring the distinguished career of Herbert H. Sawin [videorecording], 2008 October 20.
Invited session of the 55th AVS International Symposium, held in Boston, Massachusetts in October 2008. The session was sponsored by the AVS Plasma Science and Technology Division, and moderated by J. P. Chang of the University of California, Los Angeles. Talks (and presenters) include: "Plasma Etching - The Early Days" (J. W. Coburn); "Following Moores Law - How Many Knobs are Enough?" (R. A. Gottscho, K. Smekalin); "Real Time and 3D Characterization Techniques to Control Plasma Etch Processeses at the Nanometer Scale" (O. Joubert); "Investigations of Plasma-Polymer Interactions For Nanoscale Patterning of Materials" (G. S. Oehrlein); "Will Recombination Reaction Probabilities at Plasma Chamber Walls Ever Be Non-Adjustable Parameters?" (V. M. Donnelly); "Ion-Surface Interactions Beyond Etching" (K. P. Giapis); "Can Plasma Modeling Be a Predictive Tool in Process Development?: Etching of Very High Aspect Ratio Features and Gate Stacks" (M. Wang, Y. Yang, J. Shoeb, M. J. Kushner); "Predictive Etch Profile under Competition Among Deposition, Etching, and Charging on Dielectrics in a Low Temperature Plasma" (T. Makabe); and "Silicon Processing Technologies in Adjacent Spaces: Applications Beyond Information Technology" (T. Dalton).
Sawin, Herbert Harold
Plasma (Ionized gases)
Plasma (Ionized gases) -- Research.
Plasma (Physics) -- Research.
Video recordings. aat
Coburn, John (John W.)
Dalton, T.
Donnelly, Vincent M.
Giapis, K. P.
Gottscho, R. A.
Joubert, O.
Kushner, Mark J.
Makabe, T. (Toshiaki)
Oehrlein, G. S.
Shoeb, J.
Smekalin, K. E.
Wang, M.
Yang, Y.
American Vacuum Society.
American Vacuum Society. Plasma Science and Technology Division.
AIP-ICOS
American Institute of Physics. Niels Bohr Library & Archives. One Physics Ellipse, College Park, MD 20740, USA
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