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American Vacuum Society. International Symposium (46th: 1999: Seattle, Wash)
Vacuum contributions to the semiconductor industry [videorecording], 1999.
Video recording of a session given during the annual AVS (formerly American Vacuum Society) international symposium, held in 1999 in Seattle, Washington. The session was organized by the AVS History Committee and the AVS Vacuum Technology Division (VTD). Speakers (and topics dicussed) include: Donald E. Meyer (measurement and control tools for the semiconductory industry, dessicators, adsorption); Robert K. Waits (evolution of vacuum equipment and technology); Richard L. Bersin (plasma etching and ashing, evolution of equipment); Chuck Yarling (milestones in ion implantation); Donald M. Mattox (ion and plasma sources, etching); and John O'Hanlon (outgassing, water aerosols).
Bersin, Richard L.
Mattox, D. M.
Meyer, Donald E.,
O'Hanlon, John F., 1937-
Waits, Robert K.
Yarling, C. B.
Adsorption.
Aerosols.
Ion implantation.
Plasma etching.
Semiconductor industry.
Vacuum technology.
Video recordings. aat
Bersin, Richard L.
Mattox, D. M.
Meyer, Donald E.,
O'Hanlon, John F., 1937-
Waits, Robert K.
Yarling, C. B.
American Vacuum Society.
American Vacuum Society. History Committee.
American Vacuum Society. Vacuum Technology Division.
AIP-ICOS
American Institute of Physics. Niels Bohr Library & Archives. One Physics Ellipse, College Park, MD 20740, USA
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